PREPARATION OF SIO2-MXOY THIN-FILMS AND GELS BY SOL-GEL METHOD USING SILICIC-ACID AND METAL-HALIDES

KAŞGÖZ, Ahmet; MISONO, T; ABE, Y

doi:10.2109/jcersj.100.763

PREPARATION OF SIO2-MXOY THIN-FILMS AND GELS BY SOL-GEL METHOD USING SILICIC-ACID AND METAL-HALIDES

NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, cilt.100, sa.5, ss.763-765, 1992 (SCI-Expanded)

Yayın Türü: Makale / Tam Makale
Cilt numarası: 100 Sayı: 5
Basım Tarihi: 1992
Doi Numarası: 10.2109/jcersj.100.763
Dergi Adı: NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN
Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
Sayfa Sayıları: ss.763-765
İstanbul Üniversitesi Adresli: Hayır

Özet

A method for preparing SiO2-M(x)O(y) (M = Ti, Sb, V, Zr, Sn) thin films and monolithic gels was investigated. The reaction of silicic acid (SA) with metal chlorides or oxychlorides in organic solvents gave homogeneous solutions. Transparent gel films and gels were obtained by dip-coating of a glass substrate and aging of the solutions in a polyethylene beaker, respectively. Heat treatment of the gel films yielded oxide thin films with thickness from 0.1 to 0.4-mu-m with a transmittance of above 90%.