Characterization of MBE and Magnetron Sputtering grown MgNiO alloys

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Doğan Ü., Sarcan F., Erol A.

NanoTR-16, Ankara, Turkey, 5 - 08 August 2022, pp.1, (Summary Text)

  • Publication Type: Conference Paper / Summary Text
  • City: Ankara
  • Country: Turkey
  • Page Numbers: pp.1
  • Istanbul University Affiliated: Yes

Abstract

In this study, morphological, optical and electrical properties are investigated using Atomic Force Microscopy (AFM), absorption spectroscopy, photoconductivity and current-voltage measurements. MgxNi1-xO samples were grown on strontium titanate (SrTiO3 , STO) substrate using the Molecular Beam Epitaxy (MBE) method. Samples grown using Magnetron Sputtering systems were grown on fused silica substrate. At the choice of substrates, high transmission characteristic in UV and VIS regions of electromagnetic spectrum of the substrates are considered [1]. Fused silica has superior transmittance compared to the STO in UV-VIS region. Band gap of the films as a function of elemental concentrations were determined from the analysis of the absorption and photoconductivity measurements. Incorporation of Mg into the lattice of the host material NiO was seen to cause a blue-shift of 12.6% meV/Mg in the bandgap