PREFERRED ORIENTATION IN ERBIUM THIN-FILMS OBSERVED USING SYNCHROTRON RADIATION


Player M., Marr G., Gu E., Savaloni H., ÖNCAN N., Munro I.

JOURNAL OF APPLIED CRYSTALLOGRAPHY, cilt.25, ss.770-777, 1992 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 25
  • Basım Tarihi: 1992
  • Doi Numarası: 10.1107/s0021889892006320
  • Dergi Adı: JOURNAL OF APPLIED CRYSTALLOGRAPHY
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Sayfa Sayıları: ss.770-777
  • İstanbul Üniversitesi Adresli: Hayır

Özet

This paper describes the use of energy-dispersive diffraction using synchrotron radiation to obtain preliminary measurements of pole figures for a 6099 angstrom erbium film deposited by UHV evaporation on molybdenum substrates. A low glancing angle is used and the pole-figure polar distance is scanned by rotating the sample about the direction of the incident beam. Correction formulae are derived for pole-figure intensity and position in this geometry. Results confirm strong 002 orientation of films deposited at a 673 K substrate temperature (near the middle of zone II for erbium), show that at an ambient substrate temperature (zone I) there is a mixture of 002 and 101 orientations, and demonstrate strong dependence of the 002 orientation direction (for zone II temperatures) on the angle of vapour incidence during deposition.