Akademik Veri Yönetim Sistemi
CSPM 2024, Ohrid, Makedonya, 19 - 22 Eylül 2024, ss.1, (Özet Bildiri)
We report structural and optical properties of MgxNi1-xO thin films fabricated on fused silica substrates via co-sputtering of NiO and MgO using the radio frequency (RF) magnetron sputtering method. The structural properties of these films were examined by x-ray diffraction (XRD) measurements. The characteristic 2Ѳ diffraction peaks of Ni and Mg vary depending on the NiO target power, which was ranged from 40W to 120W. Energy-dispersive X-ray spectroscopy (EDS) analysis indicates that increasing NiO target power elevates the Ni elemental ratio while reducing the Mg ratio of MgxNi1-xO alloy. Scanning electron microscopy (SEM) demonstrates that the particle sizes of the MgxNi1-xO thin films change with annealing time and the NiO target power. Atomic force microscopy (AFM) measurements reveal a correlation between surface roughness and both the NiO target power. The room temperature bandgap of MgxNi1-xO is observed to be 4.6 eV at 40W NiO target power and red-shifted by 734 meV with increasing NiO target power from 40W to 120W.