Growth of Ge Nanowires by Chemical Vapor Deposition at Atmospheric Pressure Using Readily Available Precursors GeO2 and C2H5OH

Altay M. C., Eroglu S.

JOM, cilt.72, sa.12, ss.4340-4345, 2020 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 72 Sayı: 12
  • Basım Tarihi: 2020
  • Doi Numarası: 10.1007/s11837-020-04401-3
  • Dergi Adı: JOM
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus, ABI/INFORM, Aerospace Database, Applied Science & Technology Source, Communication Abstracts, Compendex, Computer & Applied Sciences, INSPEC, Metadex, Civil Engineering Abstracts
  • Sayfa Sayıları: ss.4340-4345
  • İstanbul Üniversitesi Adresli: Evet

Özet

The aim of the present study is to investigate chemical vapor deposition of Ge nanowires from readily available precursors solid GeO2 and liquid ethanol (C2H5OH) at atmospheric pressure. Gaseous GeO was generated in situ by the reactions between the reactants in the source temperature range from 1000 K to 1200 K. Ge wires were grown from the gaseous species transported from the source to the Au-coated Si substrate heated to 723 K for 5 min and 15 min. The diameter of the Ge wires slightly increased with increasing source temperature for the growth time of 5 min. The mean diameter (similar to 220 nm) of the wires grown from the species generated at 1200 K for 15 min was greater than those of the other samples (range similar to 120 nm to 145 nm) owing to excessive Ge deposition on previously formed Ge wires. The growth of the Ge nanowires is discussed in terms of the vapor-liquid-solid mechanism and the reduction reactions between the species derived from the precursors.